Revlon Photo Ready Candid Foundation - 310 Butterscotch Love Rush Against Pollution Induced Oxidative Stress:

Against Pollution Induced Oxidative Stress: A powerful antioxidant complex enreiched with Venuceane

In just 2 weeks

May Containyellow 6 lake (ci 15985)

PEG-7 GLYCERYL COCOATE

Revlon Photo Ready Candid Foundation - 310 Butterscotch Love Rush Against Pollution Induced Oxidative Stress:Revlon PhotoReady Candid Natural Finish, Anti Pollution Foundation is a skin care inspired ultra blendable, ultra buildable foundation. The foundation features antioxidants, anti pollution, and anti blue light and best of all, no oils, no parabens, no phthalates, no synthetic dyes and no fragrances. This foundation is medium to buildable coverage with a natural finish; it goes on like a moisturizer, then blends invisibly to even out skin tone